Products Description
ECPMA(CAS 266308-58-1)
High heat resistance & etch resistance: Cyclopentyl steric hindrance raises Tg, hard film, low shrinkage, anti-pattern collapse.
193nm high transparency: Alicyclic structure non-absorptive at 193nm, good transmittance for sufficient exposure.
Strong hydrophobicity & chemical resistance: Water and chemical resistance to protect photoresist film.
Products Specification
| Product name | ECPMA/1-ethylcyclopentyl ester |
| CAS NO | 266308-58-1 |
| ITEM NO | M251 |
| Appearance | Colorless to light yellow transparent liquid |
| Purity | 99.5% |
| Flash point | 85℃ |
| Density | 0.95(20℃) |
| Package | 100g/1kg/10kg etc. |
| Delivery | 5-8days |
| Storage | 2–8℃ |
| MSDS/COA/TDS | Connect us |
Products Application
1. Key Monomers for 193nm ArF Photoresists:In 193nm immersion lithography for semiconductor manufacturing, EXPMA serves as a key raw material for the film-forming resins used in chemically amplified resists (CAR).
2. High-Performance Weather-Resistant Protective Coatings:ECPMA can be copolymerized to produce functional resins with high weather resistance, high wear resistance, and high transparency.
3. Functional Polymers and Precision Adhesives:ECPMA can be copolymerized with conventional monomers such as MMA to produce functional resins characterized by low shrinkage, high strength, and high hydrophobicity.
4. Biomedical Carrier Materials.
FAQ
Q1:What is the function of ECPMA in ArF photoresist?
Re: It acts as the acid-cleavable main monomer. The tertiary ester deprotects under acid after exposure to realize developer solubility, and alicyclic ring improves etching resistance.
Q2：What are the storage requirements? Is it prone to spontaneous polymerization?
Re:Due to the presence of methacrylate double bonds, it is prone to spontaneous polymerization when exposed to high temperatures or light. It is recommended to store it in a sealed container, protected from light, at 2–8°C; do not leave it at room temperature for extended periods.
Q3:What is the solubility of ECPMA?
Re:It is soluble in common lithography solvents such as PGMEA, EL, and ethyl acetate, but is insoluble in water.
Q4:What is 1-ethylcyclopentyl methacrylate?
Re:1-Ethylcyclopentyl methacrylate is a functional methacrylate monomer that can be used in fields such as functional polymers, specialty resins, and electronic materials.
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