Product Specification
|
Product name |
Copper(II) triflate/COPPER(II)TRIFLUOROMETHANESULFONATE |
|
CAS NO |
34946-82-2 |
|
ITEM NO |
M34946822 |
|
Melting point |
≥300°C |
|
Moisture content |
0.25% |
|
Density |
1.91g/cm³ |
|
Package |
100g/1kg/25kg/200kg |
|
Delivery |
2-3days |
|
Storage |
5~30℃ |
|
MSDS/COA |
connect us |

FAQ
Copper(II) triflate (CAS:34946-82-2)What other specific applications are there in the field of materials?
1.Catalytic polymerization reaction
2.Preparation of functional coatings
3.Synthesis of nanomaterials
4.Improvement of composite material properties
5.Preparation of conductive materials
Why is the catalytic activity of Copper(II) triflate (CAS:34946-82-2) stronger than that of ordinary copper sulfate?
1. Anion effect
2. Stability and solubility
3. Electronic effect
Which types of classical reactions are catalyzed by Copper(II) triflate (CAS :34946-82-2)?
1.Sugerozation reactions
2.C-O coupling reactions
3.Friedel-Crafts reactions
4.Diels-Alder reactions
5.Asymmetric cyclization reactions
6.Michael addition reactions
Copper(II) triflate (CAS:34946-82-2) Leakage Emergency Response?
1. Personnel Protective Measures, Protective Equipment, and Emergency Response Procedures: All equipment used during operation should be grounded.
2. Isolate the leak source if possible.
3. Eliminate all ignition sources.
4.Establish a warning zone based on the area affected by liquid flow, vapor, or dust diffusion. Unrelated personnel should evacuate to a safe area from the crosswind and upwind directions.
What are the core advantages of this electroplating solution compared to traditional copper sulfate solutions?
The core advantages stem from the non-coordination nature of the trifluoromethanesulfonate anion (OTf⁻), the physicochemical properties of the perfluorinated anions, and the comprehensive improvement in copper ion dissociation efficiency, coating film formation quality, and solution stability within the electroplating system. This is particularly suitable for high-end electroplating scenarios such as precision electronics, semiconductors, and flexible devices, and compensates for many shortcomings of the copper sulfate electroplating solution in demanding scenarios.
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